Estimation of the Efficiency of Material Injection into the Reflex Discharge by Sputtering the Cathode Material

TL;DR

This paper presents a calculation model to estimate the sputtering-based injection efficiency of cathode material into a pulsed reflex discharge plasma, aligning well with experimental data.

Contribution

A new calculation model for sputtering-based material injection into reflex discharge plasma is proposed, enhancing understanding of plasma formation processes.

Findings

Model accurately predicts sputtering parameters

Results agree with experimental data

Provides insights into plasma formation mechanisms

Abstract

The processes of injection of a sputtered-and-ionized working material into the pulsed reflex discharge plasma have been considered at the initial stage of dense gas-metal plasma formation. A calculation model has been proposed to estimate the parameters of the sputtering mechanism for the required working material to be injected into the discharge. The data obtained are in good accordance with experimental results.