Research on diffusion of Mo substrate atoms into Ti and Cr thin films by secondary ion-ion emission method

TL;DR

This study measures how Mo substrate atoms diffuse into Ti and Cr thin films using the secondary ion-ion emission method, providing insights into diffusion behavior in these metal systems.

Contribution

It introduces a new experimental approach to quantify diffusion coefficients of Mo atoms into Ti and Cr thin films.

Findings

Mo atoms diffuse into Ti and Cr films.

Diffusion coefficients are quantitatively measured.

Diffusion behavior varies with film thickness.

Abstract

The experimental research on the nature of diffusion by the Mo substrate atoms into the Ti and Cr deposited thin films is completed by the secondary ion-ion emission method. In [1], the initial stage of the Ti thin film on the Mo substrate deposition process, using the Ti evaporation technique in the vacuum, is researched. It was found that the Mo substrate atoms diffuse into the continuously deposited Ti thin film. The diffusion of Mo substrate atoms by the nodes of crystal grating in the deposited metallic Ti thin film with the continuously increasing thickness is theoretically considered in [2]. In this research, the diffusion coefficients of Mo substrate atoms into the Ti and Cr thin films are measured by the secondary ion-ion emission method in the Mo-Ti and Mo-Cr systems.