Conduction mechanisms of epitaxial EuTiO3 thin films
R. Zhao, W. W. Li, L. Chen, Q. Q. Meng, J. Yang, H. Wang, Y. Q. Wang,, R. J. Tang, and H. Yang

TL;DR
This study investigates the conduction mechanisms in epitaxial EuTiO3 thin films, revealing temperature- and voltage-dependent behaviors including space-charge-limited current, Schottky emission, and Fowler-Nordheim tunneling, with Eu3+ ions contributing to leakage.
Contribution
It provides a detailed analysis of conduction mechanisms in EuTiO3 thin films across different temperatures and biases, highlighting the role of Eu3+ ions in leakage currents.
Findings
Space-charge-limited current dominates from 50 to 150 K.
Schottky emission occurs at 200-300 K under negative bias.
Fowler-Nordheim tunneling occurs at 200-300 K under positive bias.
Abstract
To investigate leakage current density versus electric field characteristics, epitaxial EuTiO3 thin films were deposited on (001) SrTiO3 substrates by pulsed laser deposition and were post-annealed in a reducing atmosphere. This investigation found that conduction mechanisms are strongly related to temperature and voltage polarity. It was determined that from 50 to 150 K the dominant conduction mechanism was a space-charge-limited current under both negative and positive biases. From 200 to 300 K, the conduction mechanism shows Schottky emission and Fowler-Nordheim tunneling behaviors for the negative and positive biases, respectively. This work demonstrates that Eu3+ is one source of leakage current in EuTiO3 thin films.
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