Quasi-logarithmic spacing law in dewetting patterns from the drying meniscus of a polymer solution
Yong-Jun Chen, Kosuke Suzuki, Hitoshi Mahara, Tomohiko Yamaguchi

TL;DR
This paper investigates the formation of periodic patterns in a drying polymer solution meniscus, revealing a quasi-logarithmic spacing law driven by contact line stick-slip dynamics, supported by a proposed evaporation-based model.
Contribution
It introduces a novel quasi-logarithmic spacing law in dewetting patterns and a model explaining the contact line dynamics during evaporation.
Findings
Discovery of a quasi-logarithmic spacing relation in patterns
Identification of stick-slip motion as the pattern formation mechanism
Development of a model based on meniscus evaporation dynamics
Abstract
We report on a periodic precipitation pattern emerged from a drying meniscus via evaporation of a polystyrene solution in a Petri dish. It appeared a quasi-logarithmic spacing relation in the pattern as a result of stick-slip motion of the contact line towards the wall. A model based on the dynamics of the evaporating meniscus is proposed.
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