Transfer-free electrical insulation of epitaxial graphene from its metal substrate
Silvano Lizzit, Rosanna Larciprete, Paolo Lacovig, Matteo Dalmiglio,, Fabrizio Orlando, Alessandro Baraldi, Lauge Gammelgaard, Lucas Barreto, Marco, Bianchi, Edward Perkins, Philip Hofmann

TL;DR
This paper presents a method to electrically insulate epitaxial graphene from its metal substrate using a step-wise intercalation process, enabling the use of graphene's transport properties without substrate interference.
Contribution
It introduces a novel transfer-free insulation technique for epitaxial graphene via silicon and oxygen intercalation forming a SiO₂ layer.
Findings
Successful insulation of graphene from Ru(0001) substrate
Electrical insulation confirmed by nano-scale multipoint probe
Intercalation process characterized by x-ray photoemission spectroscopy
Abstract
High-quality, large-area epitaxial graphene can be grown on metal surfaces but its transport properties cannot be exploited because the electrical conduction is dominated by the substrate. Here we insulate epitaxial graphene on Ru(0001) by a step-wise intercalation of silicon and oxygen, and the eventual formation of a SiO layer between the graphene and the metal. We follow the reaction steps by x-ray photoemission spectroscopy and demonstrate the electrical insulation using a nano-scale multipoint probe technique.
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