Performance of volume phase gratings manufactured using ultrafast laser inscription
David Lee, Robert R. Thomson, Colin R. Cunningham

TL;DR
This study demonstrates the use of ultrafast laser inscription to create volume phase gratings in dielectric glasses, achieving high diffraction efficiency and thermal resilience, with potential for advanced astronomical applications.
Contribution
It introduces a novel application of ULI for fabricating VPGs in various dielectric materials, including mid-IR glasses, with detailed performance analysis.
Findings
GLS gratings achieved 71% diffraction efficiency at 633 nm.
Both gratings survived cooling to 20 K, suitable for astronomy.
ULI enables complex and blazed grating designs in diverse materials.
Abstract
Ultrafast laser inscription (ULI) is a rapidly maturing technique which uses focused ultrashort laser pulses to locally modify the refractive index of dielectric materials in three-dimensions (3D). Recently, ULI has been applied to the fabrication of astrophotonic devices such as integrated beam combiners, 3D integrated waveguide fan-outs and multimode-to-single mode convertors (photonic lanterns). Here, we outline our work on applying ULI to the fabrication of volume phase gratings (VPGs) in fused silica and gallium lanthanum sulphide (GLS) glasses. The VPGs we fabricated had a spatial frequency of 333 lines/mm. The optimum fused silica grating was found to exhibit a first order diffraction efficiency of 40 % at 633 nm, but exhibited approximately 40 % integrated scattered light. The optimum GLS grating was found to exhibit a first order diffraction efficiency of 71 % at 633 nm and…
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