Temperature-dependent 2D-3D growth transition of ultra-thin Pt films deposited by PLD
Henning Galinski, Thomas Ryll, Philipp Reibisch, Lukas Schlagenhauf,, Iwan Schenker, Ludwig J. Gauckler

TL;DR
This study investigates how deposition temperature influences the growth mode of ultra-thin platinum films on zirconia, revealing a transition from 2D to 3D growth above 573 K and using simulations to replicate experimental morphologies.
Contribution
It demonstrates the temperature-dependent growth transition of Pt films and introduces a kinetic Monte Carlo model that accurately reproduces experimental morphologies.
Findings
Growth transition from 2D to 3D at T > 573 K
Critical cluster size of 4 atoms influences morphology
Asymmetric Ehrlich-Schwoebel barrier affects diffusion
Abstract
During the growth of metal thin films on dielectric substrates at a given deposition temperature T, the film's morphology is conditioned by the magnitude and asymmetry of up- and downhill diffusion. Any severe change of this mechanism leads to a growth instability, which induces an alteration of the thin film morphology. In order to study this mechanism, ultra-thin Pt films were deposited via pulsed laser deposition (PLD) onto yttria-stabilized-zirconia single crystals at different deposition temperatures. The morphological evolution of Pt thin films has been investigated by means of scanning electron microscopy (SEM), atomic force microscopy (AFM) and standard image analysis techniques. The experimentally obtained morphologies are compared to simulated thin film structures resulting from a two-dimensional kinetic Monte Carlo (KMC) approach. Two main observations have been made: i) Thin…
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