Pattern formation in a model of photochemical reaction
Hidetsugu Sakaguchi, Daishiro Kijima, Shunsuke Chatani, and Toshiaki, Hattori
TL;DR
This paper presents a mathematical model and numerical simulation demonstrating the formation of stripe and columnar patterns in photopolymer films under UV irradiation, explaining observed experimental phenomena.
Contribution
It introduces a new mathematical model of photopolymerization that predicts spatially periodic structures, advancing understanding of pattern formation in photochemical reactions.
Findings
Numerical simulations show formation of periodic columnar structures.
The model reproduces experimentally observed patterns.
Pattern formation depends on irradiation conditions.
Abstract
Stripe and columnar patterns were experimentally found in photopolymer films during irradiation of collimated UV light. We propose a mathematical model of photopolymerization, perform numerical simulation, and find a spatially periodic columnar structure.
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Taxonomy
TopicsComputer Graphics and Visualization Techniques · Photopolymerization techniques and applications