Etch Induced Microwave Losses in Titanium Nitride Superconducting Resonators

TL;DR

This study compares microwave losses in titanium nitride superconducting resonators fabricated with different etching methods, revealing that fluorine etching yields lower losses than chlorine etching or ion milling, especially at single-photon powers.

Contribution

It provides a detailed analysis of how different patterning methods affect microwave losses in TiN resonators, highlighting the advantages of fluorine-based etching.

Findings

Fluorine-etched resonators have lower microwave loss than chlorine-etched ones.

Ion-milled resonators exhibit significantly higher loss due to silicon re-deposition.

Loss differences are linked to surface chemistry and fabrication-induced re-deposition.

Abstract

We have investigated the correlation between the microwave loss and patterning method for coplanar waveguide titanium nitride resonators fabricated on Si wafers. Three different methods were investigated: fluorine- and chlorine-based reactive ion etches and an argon-ion mill. At high microwave probe powers the reactive etched resonators showed low internal loss, whereas the ion-milled samples showed dramatically higher loss. At single-photon powers we found that the fluorine-etched resonators exhibited substantially lower loss than the chlorine-etched ones. We interpret the results by use of numerically calculated filling factors and find that the silicon surface exhibits a higher loss when chlorine-etched than when fluorine-etched. We also find from microscopy that re-deposition of silicon onto the photoresist and side walls is the probable cause for the high loss observed for the ion-milled resonators