Tailoring Nanostructures Using Copolymer Nanoimprint Lithography

TL;DR

This paper presents a novel nanoimprint lithography technique that uses surface energy and nanorheology to create defect-free, high-density nanostructures with controlled orientation, suitable for advanced memory and optical devices.

Contribution

It introduces a new method combining surface energy control and nanorheology to direct self-assembly of block copolymers for high-quality nanostructure fabrication.

Findings

Achieved defect-free nanostructures over tens of micrometers.

Controlled in-plane orientations of 25 nm lamellar structures.

Demonstrated application to magnetic head tracks.

Abstract

Finding affordable ways of generating high-density ordered nanostructures that can be transferred to a substrate is a major challenge for industrial applications like memories or optical devices with high resolution features. In this work, we report on a novel technique to direct self-assembled structures of block copolymers by NanoImprint Lithography. Surface energy of a reusable mold and nanorheology are used to organize the copolymers in defect-free structures over tens of micrometers in size. Versatile and controlled in-plane orientations of about 25 nm half-period lamellar nanostructures are achieved and, in particular, include applications to circular tracks of magnetic reading heads.