Plasmonic modulator optimized by patterning of active layer and tuning permittivity
Viktoriia E. Babicheva, Andrei V. Lavrinenko

TL;DR
This paper presents an optimized ultra-compact plasmonic modulator using patterned ITO layers and permittivity tuning, enhancing performance and enabling active control of reflection in integrated photonic circuits.
Contribution
It introduces a novel design with patterned ITO layers and permittivity tuning, improving transmittance and enabling active Bragg grating modulation in plasmonic waveguides.
Findings
Patterned ITO layers increase transmittance without performance loss.
Optimal permittivity values enhance modulator efficiency.
Pattern size and filling factor significantly affect device performance.
Abstract
We study an ultra-compact plasmonic modulator that can be applied in photonic integrated circuits. The modulator is a metal-insulator-metal waveguide with an additional ultra-thin layer of indium tin oxide (ITO). Bias is applied to the multilayer core by means of metal plates that serve as electrodes. External field changes carrier density in the ultra-thin ITO layer, which influences the permittivity. The metal-insulator-metal system possesses a plasmon resonance, and it is strongly affected by changes in the permittivity of the active layer. To improve performance of the structure we propose several optimizations. We examine influence of the ITO permittivity on the modulator's performance and point out appropriate values. We analyze eigenmodes of the waveguide structure and specify the range for its efficient operation. We show that substituting the continuous active layer by a…
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