Synthesis of Large-Area MoS2 Atomic Layers with Chemical Vapor Deposition
Yi-Hsien Lee, Xin-Quan Zhang, Wenjing Zhang, Mu-Tung Chang, Cheng-Te, Lin, Kai-Di Chang, Ya-Chu Yu, Jacob Tse-Wei Wang, Chia-Seng Chang, Lain-Jong, Li, Tsung-Wu Lin
TL;DR
This paper reports a method for synthesizing large-area, high-quality monolayer MoS2 atomic sheets on SiO2 substrates using chemical vapor deposition, verified by multiple characterization techniques.
Contribution
It introduces a CVD process for producing large-area, crystalline monolayer MoS2, advancing scalable synthesis methods.
Findings
Successful growth of large-area MoS2 monolayers
High crystallinity confirmed by TEM
Optical and electrical properties consistent with monolayer MoS2
Abstract
Large-area MoS2 atomic layers are synthesized on SiO2 substrates by chemical vapor deposition using MoO3 and S powders as the reactants. Optical, microscopic and electrical measurements suggest that the synthetic process leads to the growth of MoS2 monolayer. The TEM images verify that the synthesized MoS2 sheets are highly crystalline.
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