Chemical order and crystallographic texture of FePd:Cu thin alloy films
Marcin Perzanowski, Yevhen Zabila, Michal Krupinski, Arkadiusz, Zarzycki, Aleksander Polit, Marta Marszalek

TL;DR
This study investigates how Cu addition and substrate choice influence the chemical order and crystallographic texture of FePd thin alloy films, aiming to optimize their properties for magnetic storage applications.
Contribution
It provides a detailed analysis of lattice parameters, chemical order, and texture in FePd:Cu films, introducing a novel approach to assess dopant atom effects using synchrotron XRD and pole figures.
Findings
Cu alters lattice parameters and induces lattice distortion.
Substrate type affects chemical order and texture.
Different annealing methods influence alloy structure.
Abstract
FePd thin films have been recently considered as promising material for high-density magnetic storage devices. However, it is necessary to find a proper method of fabrication for the (001)-textured and chemically well-ordered alloy. In this paper, we present the detailed investigations of lattice parameters, chemical order degree, grain sizes and crystallographic texture, carried out on FePd alloys with 10 at.% of Cu addition. The initial [Cu(0.2 nm)/Fe(0.9 nm)/Pd(1.1 nm)]x5 multilayers were thermally evaporated in an ultra-high vacuum on MgO(100), Si(100), Si(111) and Si(100) covered by 100 nm thick layer of amorphous SiO2. In order to obtain homogeneous FePd:Cu alloy, the multilayers were annealed in two different ways. First, the samples were rapidly annealed in nitrogen atmosphere at 600oC for 90 seconds. Next, the long annealing in a high vacuum for 1 hour at 700oC was done. This…
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