Effective mass theory of monolayer \delta-doping in the high-density limit
Daniel W. Drumm, Lloyd C. L. Hollenberg, Michelle Y. Simmons, and Mark, Friesen

TL;DR
This paper develops an effective mass analytical model for high-density monolayer -doped silicon, capturing screening, disorder, and many-body effects, and analyzing valley splitting behaviors relevant for atomic-scale device applications.
Contribution
It introduces a simplified yet accurate effective mass theory for high-density -doped silicon, including exchange and correlation effects, reducing computational complexity compared to density functional theory.
Findings
Valley splitting in the band increases rapidly with density.
Exchange and correlation significantly influence valley splitting.
The model aligns well with more complex density functional theory results.
Abstract
Monolayer \delta-doped structures in silicon have attracted renewed interest with their recent incorporation into atomic-scale device fabrication strategies as source and drain electrodes and in-plane gates. Modeling the physics of \delta-doping at this scale proves challenging, however, due to the large computational overhead associated with ab initio and atomistic methods. Here, we develop an analytical theory based on an effective mass approximation. We specifically consider the Si:P materials system, and the limit of high donor density, which has been the subject of recent experiments. In this case, metallic behavior including screening tends to smooth out the local disorder potential associated with random dopant placement. While smooth potentials may be difficult to incorporate into microscopic, single-electron analyses, the problem is easily treated in the effective mass theory…
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