First-principles study of native point defects in topological insulator Bi$_2$Se$_3$
Shuang-Xi Wang, Ping Zhang, Shu-Shen Li

TL;DR
This study uses first-principles calculations to identify native point defects responsible for the n-type doping in Bi$_2$Se$_3$, explaining its natural electronic properties and surface behavior.
Contribution
It provides a detailed first-principles analysis of native point defects in Bi$_2$Se$_3$, revealing their roles in n-type doping and surface electronic structure.
Findings
Se vacancies and Se$_{Bi}$ antisite dominate donor-like doping
Bi$_{Se1}$ defect leads to donor pairs involving Se vacancies and Bi interstitials
Defect-induced band structure modifications explain n-type preference
Abstract
The \emph{p}-type BiSe is much desirable as a promising thermoelectric material and topological insulator, while the naturally grown BiSe is always \emph{n}-type doped by native point defects. Here we use first-principles calculations to identify the origin of the \emph{n}-type tendency in bulk BiSe: The Se vacancies (V and V) and Se antisite dominate the donorlike doping with low formation energy, while the predisposed Bi defect results in the pair of V and Bi interstitial, which is also a donor rather than an acceptor. Moreover, for BiSe(111) surface, we find that the band structures modulated by the defects explicitly account for the existing experimental observations of \emph{n}-type preference.
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Taxonomy
TopicsTopological Materials and Phenomena · Advanced Thermoelectric Materials and Devices · 2D Materials and Applications
