Patterning graphene nanostripes in substrate-supported functionalized graphene: A promising route to integrated, robust, and superior transistors

TL;DR

This paper proposes a method to create stable, high-quality graphene nanostripes on functionalized graphene substrates using electron-beam lithography, advancing the development of practical graphene transistors with improved performance and integration.

Contribution

It introduces a novel fabrication approach for graphene nanostripes on functionalized substrates, enhancing stability and scalability for transistor applications.

Findings

Stable graphene nanostripes can be integrated using electron-beam lithography.

Parallelizing nanostripes improves transistor performance.

Functionalized graphene supports high-quality nanostripes for electronics.

Abstract

It is promising to apply quantum-mechanically confined graphene systems in field-effect transistors. High stability, superior performance, and large-scale integration are the main challenges facing the practical application of graphene transistors. Our understandings of the adatom-graphene interaction combined with recent progress in the nanofabrication technology indicate that very stable and high-quality graphene nanostripes could be integrated in substrate-supported functionalized (hydrogenated or fluorinated) graphene using electron-beam lithography. We also propose that parallelizing a couple of graphene nanostripes in a transistor should be preferred for practical application, which is also very useful for transistors based on graphene nanoribbon.