Sub-Rayleigh lithography using high flux loss-resistant entangled states of light

TL;DR

This paper presents a scalable quantum lithography scheme that produces features narrower than classical limits, with enhanced loss resistance, using a mixture of entangled and classical light, and demonstrates up to 30% fringe narrowing with reduced quantum resource use.

Contribution

It introduces a new interferometric lithography method combining entangled and classical light to achieve sub-Rayleigh resolution with improved loss tolerance.

Findings

Up to 30% fringe narrowing compared to classical schemes.

Achieved with only 10% of the non-classical light needed for NOON states.

Demonstrated scalable and loss-resistant quantum lithography.

Abstract

Quantum lithography achieves phase super-resolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable, with reduced use of quantum resources and consequently enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of an SPDC entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the non-classical light required for creating NOON states.