LO-phonon assisted polariton lasing in a ZnO based microcavity
L. Orosz, F. R\'everet, F. M\'edard, P. Disseix, J. Leymarie, M., Mihailovic, D. Solnyshkov, G. Malpuech, J. Zuniga-P\'erez, F. Semond, M., Leroux, S. Bouchoule, X. Lafosse, M. Mexis, C. Brimont, T. Guillet

TL;DR
This paper investigates how LO phonons assist in polariton lasing within a ZnO microcavity, revealing the importance of phonon resonance for low-threshold lasing and the role of exciton-exciton interactions.
Contribution
It provides both experimental and theoretical analysis of polariton relaxation mechanisms, highlighting the resonance condition with LO phonons for optimal lasing threshold.
Findings
Minimum lasing threshold occurs at LO phonon resonance
Detuning from resonance increases the lasing threshold
Simulations qualitatively match experimental relaxation behaviors
Abstract
Polariton relaxation mechanisms are analysed experimentally and theoretically in a ZnO-based polariton laser. A minimum lasing threshold is obtained when the energy difference between the exciton reservoir and the bottom of the lower polariton branch is resonant with the LO phonon energy. Tuning off this resonance increases the threshold, and exciton-exciton scattering processes become involved in the polariton relaxation. These observations are qualitatively reproduced by simulations based on the numerical solution of the semi-classical Boltzmann equations.
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