Effects of Lithographic Stitching Errors on the Performance of Waveguide Bragg Gratings
Steve Zamek, Mercedeh Khajavikhan, Dawn T.H. Tan, Maurice Ayache,, Boris Slutsky, and Yeshaiahu Fainman
TL;DR
This paper examines how fabrication imperfections, specifically stitching errors from electron-beam and UV-lithography, impact the performance of waveguide Bragg gratings, highlighting the importance of manufacturing precision.
Contribution
It provides a detailed analysis of stitching errors' effects on waveguide Bragg gratings, offering insights into fabrication tolerances and performance degradation.
Findings
Stitching errors significantly affect grating performance.
Electron-beam and UV-lithography introduce different error profiles.
Understanding these errors aids in improving fabrication accuracy.
Abstract
We investigate the performance of waveguide Bragg gratings as a function of imperfections introduced in the fabrication process. Effects of stitching errors introduced in the electron-beam and UV-lithography are discussed in details.
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Taxonomy
TopicsOptical Coatings and Gratings · Photonic and Optical Devices · Surface Roughness and Optical Measurements