An intrinsic mobility ceiling of Si bulk
Nuria Garcia-Castello, Joan Daniel Prades, and Albert Cirera

TL;DR
This paper uses advanced quantum mechanical simulations to determine the maximum intrinsic mobility of bulk silicon, revealing a fundamental ceiling related to its electronic structure.
Contribution
It provides a first-principles calculation of the intrinsic mobility ceiling of bulk silicon using DFT-NEGFF methods, linking it to the material's effective mass.
Findings
Intrinsic mobility ceiling of 8.4×10^6 cm^2/V·s identified
Mobility limit related to the lowest effective mass in <001> direction
First-principles calculation approach applied to silicon conductance
Abstract
We compute by Density Functional Theory-Non Equilibrium Green Functions Formalism (DFT-NEGFF) the conductance of bulk Si along different crystallographic directions. We find a ceiling value for the intrinsic mobility of bulk silicon of . We suggest that this result is related to the lowest effective mass of the direction.
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsAdvancements in Semiconductor Devices and Circuit Design · Surface and Thin Film Phenomena · Silicon and Solar Cell Technologies
