Potential of the FLASH FEL technology for the construction of a kW-scale light source for the next generation lithography

TL;DR

This paper explores the potential of FLASH FEL technology to develop a high-power light source suitable for next-generation lithography, demonstrating feasibility for kW-scale output at relevant wavelengths.

Contribution

It presents an analysis showing that FLASH-like free electron lasers can achieve 2.6 kW power at lithography-relevant wavelengths, advancing the application of FELs in industry.

Findings

Potential to reach 2.6 kW average power at 13.5 and 6.8 nm wavelengths

FLASH technology can meet physical requirements for next-generation lithography light sources

Operating parameters suitable for industrial-scale FEL light sources are feasible

Abstract

The driving engine of the Free Electron Laser in Hamburg (FLASH) is an L-band superconducting accelerator. It is designed to operate in burst mode with 800 microsecond pulse duration at a repetition rate of 10 Hz. The maximum accelerated beam current during the macropulse is 9 mA. Our analysis shows that the FLASH technology has great potential since it is possible to construct a FLASH like free electron laser operating at the wavelength of 13.5 and 6.8 nanometer with an average power up to 2.6 kW. Such a source meets the physical requirements for the light source for the next generation lithography.