Atomistic simulations of low-field mobility in Si nanowires: Influence of confinement and orientation
Neophytos Neophytou, Hans Kosina

TL;DR
This study uses atomistic simulations to analyze how confinement and orientation affect low-field mobility in silicon nanowires, revealing size-dependent variations and potential mobility enhancements in ultra-scaled NWs.
Contribution
Developed a coupled atomistic electronic and transport simulation framework to systematically study size and orientation effects on silicon nanowire mobility.
Findings
Mobility decreases with diameter due to phonon and surface roughness scattering.
Large mobility enhancements (~4x) observed in certain p-type NWs at small diameters.
Orientation and doping type significantly influence mobility trends in scaled silicon NWs.
Abstract
A simulation framework that couples atomistic electronic structures to Boltzmann transport formalism is developed and applied to calculate the transport characteristics of thin silicon nanowires (NWs) up to 12nm in diameter. The sp3d5s*-spin-orbit-coupled atomistic tight-binding (TB) model is used for the electronic structure calculation. Linearized Boltzmann transport theory is applied, including carrier scattering by phonons, surface roughness (SRS), and impurities. We present a comprehensive investigation of the low-field mobility in silicon NWs considering: i) n- and p-type NWs, ii) [100], [110], and [111] transport orientations, and iii) diameters from D=12nm (electronically almost bulk-like) down to D=3nm (ultra-scaled). The simulation results display strong variations in the characteristics of the different NW types. For n-type NWs, phonon scattering and SRS become stronger as…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
