Ultraviolet stimulated electron source for use with low energy plasma instrument calibration
Kevin Henderson, Ron Harper, Herb Funsten, and Elizabeth MacDonald

TL;DR
This paper presents a compact, UV-stimulated electron source capable of producing a uniform, monoenergetic electron beam with precise energy and spatial control, suitable for calibration of low energy plasma instruments.
Contribution
It introduces a novel UV-LED illuminated metal cathode electron source with high uniformity, adjustable energy, and low divergence for plasma instrument calibration.
Findings
Electron beam energy spread <10 eV
Uniformity variation 15% over 1 cm^2
Beam intensity up to 10^9 electrons/cm^2s
Abstract
We have developed and demonstrated a versatile, compact electron source that can produce a monoenergetic electron beam up to 50 mm diameter from 0.1 to 30 keV with an energy spread of <10 eV. By illuminating a metal cathode plate with a single near ultraviolet (UV) light emitting diode (LED), a spatially uniform electron beam with 15% variation over 1 cm2 can be generated. A uniform electric field in front of the cathode surface accelerates the electrons into a beam with an angular divergence of <1 degree at 1 keV. The beam intensity can be controlled from 10^9 electrons/cm2s.
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Taxonomy
TopicsPhotocathodes and Microchannel Plates · CCD and CMOS Imaging Sensors · Plasma Diagnostics and Applications
