Thick-film technology for ultra high vacuum interfaces of micro-structured traps

TL;DR

This paper presents a thick-film technology-based ultra high vacuum interface capable of handling high voltages and currents, enabling compact setups for quantum information experiments with trapped ions or atoms.

Contribution

It introduces a novel thick-film vacuum interface with high signal capacity, demonstrating its effectiveness in trapping cold ytterbium ions and supporting complex quantum experiments.

Findings

Achieved ultra high vacuum pressure in the low 1e-11 mbar range.

Successfully trapped chains of cold ytterbium ions using the developed interface.

Developed a multi-channel device for precise time-dependent voltage control.

Abstract

We adopt thick-film technology to produce ultra high vacuum compatible interfaces for electrical signals. These interfaces permit voltages of hundreds of Volts and currents of several Amperes and allow for very compact vacuum setups, useful in quantum optics in general, and especially for quantum information and quantum simulations using miniaturized traps for ions or neutral atoms. Such printed circuits can also be useful as pure in-vacuum devices. We demonstrate a specific interface, which provides eleven current feedthroughs, more than 70 dc feedthroughs and a feedthrough for radio frequencies. We achieve a pressure in the low 1e-11mbar range and demonstrate the full functionality of the interface by trapping chains of cold ytterbium ions, which requires all of the signals mentioned above being present. In addition, a versatile multi-channel device for supplying precise time-dependent voltages has been developed.