Molecular Dynamics Simulation of Smaller Granular Particles Deposition on a Larger One Due to Velocity Sequence Dependent Electrical Charge Distribution

TL;DR

This study uses molecular dynamics simulations to analyze how the velocity sequence affects the deposition pattern of smaller particles on a larger particle, revealing consistent densest regions around specific angles.

Contribution

It introduces a simulation approach to study the influence of velocity sequence distributions on granular particle deposition patterns.

Findings

Densest deposition occurs around angle π/4 for velocities between 0 and 0.02.

Different velocity sequences produce similar deposition patterns.

Deposition density varies with particle velocity and sequence.

Abstract

Deposition of smaller granular particles on a larger nucleus particle has been simulated in two-dimension using molecular dynamics method. Variation of sequences of velocity of deposited particles is conducted and reported in this work. The sequences obey a normal distribution function of velocity with the same parameters. It has been observed that for velocity in range of 0 to 0.02 the densest deposited site (15-17 % number of grains) is located at about angle {\pi}/4 where location of injection point is {\pi}/4. And the less dense is about {\pi}/4 + {\pi}/2. Different sequences give similar result.