Compression of nanowires using a flat indenter: Elasticity measurement in nanoscale
Zhao Wang, W.M. Mook, Ch. Niederberger, R. Ghisleni, L. Philippe, and, J. Michler

TL;DR
This paper introduces a novel SEM-based diametrical compression method with a flat punch indenter to measure the lateral elastic modulus of individual nanowires, validated by analytical, simulation, and experimental results.
Contribution
It presents a new experimental technique for nanoscale elasticity measurement using a flat punch indenter within SEM, combined with an analytical Hertz model and finite-element validation.
Findings
Good agreement between analytical, simulation, and experimental results.
Effective characterization of nanowire elasticity at the nanoscale.
Method applicable to anisotropic nanomaterials like silicon.
Abstract
A new experimental approach for the characterization of the lateral elastic modulus of individual nanowires is demonstrated by implementing a micro/nano scale diametrical compression test geometry, using a flat punch indenter inside of a scanning electron microscope (SEM). A 250 nm diameter single crystal silicon nanowire is tested. Since silicon is highly anisotropic, the compression axis of the wire was determined by electron backscatter diffraction (EBSD). A two dimensional analytical closed-form solution based on a Hertz model is presented. The results of the analytical model are compared with those of finite-element simulations and to the experimental diametral compression results and show good agreement.
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Taxonomy
TopicsForce Microscopy Techniques and Applications · Metal and Thin Film Mechanics · Advanced Surface Polishing Techniques
