Chemical Vapor Deposition Growth of Graphene using Other Hydrocarbon Sources
Zhancheng Li, Ping Wu, Chenxi Wang, Xiaodong Fan, Wenhua Zhang,, Xiaofang Zhai, Changgan Zeng, Zhenyu Li, Jinlong Yang, and J. G. Hou

TL;DR
This paper presents a low-temperature chemical vapor deposition method for growing high-quality graphene using solid and liquid hydrocarbon sources, significantly reducing the typical growth temperature from 1000°C to as low as 300°C.
Contribution
It introduces a novel CVD process utilizing solid and liquid hydrocarbons for graphene growth at substantially lower temperatures than traditional methods.
Findings
Graphene can be grown at 400°C using solid PMMA and polystyrene.
Benzene enables monolayer graphene growth at 300°C.
First principles calculations support the low-temperature growth mechanism.
Abstract
Graphene has attracted a lot of research interests due to its exotic properties and a wide spectrum of potential applications. Chemical vapor deposition (CVD) from gaseous hydrocarbon sources has shown great promises for large-scale graphene growth. However, high growth temperature, typically 1000{\deg}C, is required for such growth. Here we demonstrate a revised CVD route to grow graphene on Cu foils at low temperature, adopting solid and liquid hydrocarbon feedstocks. For solid PMMA and polystyrene precursors, centimeter-scale monolayer graphene films are synthesized at a growth temperature down to 400{\deg}C. When benzene is used as the hydrocarbon source, monolayer graphene flakes with excellent quality are achieved at a growth temperature as low as 300{\deg}C. The successful low-temperature growth can be qualitatively understood from the first principles calculations. Our work…
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Taxonomy
TopicsGraphene research and applications · Radiation Effects in Electronics · Semiconductor materials and devices
