Determination of substrate pinning in epitaxial and supported graphene layers via Raman scattering
Nicola Ferralis, Roya Maboudian, Carlo Carraro

TL;DR
This study uses Raman spectroscopy to analyze how substrate interactions affect the thermal behavior of graphene layers, revealing substrate pinning effects in epitaxial and supported graphene.
Contribution
It provides a quantitative analysis of substrate pinning in graphene via Raman shift measurements, distinguishing between pinned and unpinned states on different substrates.
Findings
Epitaxial graphene on SiC shows a threefold higher thermal shift rate than freestanding graphene.
Graphene on Ni behaves elastically as if unpinned despite strong interaction.
Transfer protocols can alter the pinning state of exfoliated graphene layers.
Abstract
The temperature-induced shift of the Raman G line in epitaxial graphene on SiC and Ni surfaces, as well as in graphene supported on SiO2, is investigated with Raman spectroscopy. The thermal shift rate of epitaxial graphene on 6H-SiC(0001) is found to be about three times that of freestanding graphene. This result is explained quantitatively as a consequence of pinning by the substrate. In contrast, graphene grown on polycrystalline Ni films is shown to be unpinned, i.e., to behave elastically as freestanding, despite the relatively strong interaction with the metal substrate. Moreover, it is shown that the transfer of exfoliated graphene layers onto a supporting substrate can result in pinned or unpinned layers, depending on the transfer protocol.
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Taxonomy
TopicsGraphene research and applications · Silicon Carbide Semiconductor Technologies · Thermal properties of materials
