Electrical Properties of Conductive Ge Nanocrystal Thin Films Fabricated by Low Temperature In-situ Growth
B. Zhang, Y. Yao, R. Patterson, S. Shrestha, M. A. Green, G., Conibeer

TL;DR
This study investigates the electrical properties of Ge nanocrystal thin films fabricated by low-temperature in-situ growth, revealing high p-type conductivity due to surface states and exploring their potential in photovoltaic devices.
Contribution
It demonstrates a novel low-temperature fabrication method for Ge nanocrystal films exhibiting intrinsic p-type conductivity without intentional doping.
Findings
High p-type conductivity due to surface states
Conductivity enhanced by thermal annealing
Photovoltaic effect demonstrated in heterojunction diodes
Abstract
Thin films composed of Ge nanocrystals embedded in amorphous SiO2 matrix (Ge-NCs TFs) were prepared using a low temperature in-situ growth method. Unexpected high p-type conductivity was observed in the intrinsic Ge-NCs TFs. Unintentional doping from shallow dopants was excluded as a candidate mechanism of hole generation. Instead, the p-type characteristic was attributed to surface state induced hole accumulation in NCs, and the hole conduction was found to be a thermally activated process involving charge hopping from one NC to its nearest neighbor. Theoretical analysis has shown that the density of surface states in Ge-NCs is sufficient to induce adequate holes for measured conductivity. The film conductivity can be improved significantly by post-growth rapid thermal annealing and this effect is explained by a simple thermodynamic model. The impact of impurities on the conduction…
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