Graphene films with large domain size by a two-step chemical vapor deposition process
Xuesong Li, Carl W. Magnuson, Archana Venugopal, Jinho An, Ji Won Suk,, Boyang Han, Mark Borysiak, Weiwei Cai, Aruna Velamakanni, Yanwu Zhu, Lianfeng, Fu, Eric M. Vogel, Edgar Voelkl, Luigi Colombo, and Rodney S. Ruoff

TL;DR
This paper presents a two-step chemical vapor deposition method to produce large-area graphene films with significantly increased domain sizes, leading to improved electrical properties such as higher carrier mobility.
Contribution
The study introduces a novel two-step CVD process that enhances graphene domain size to hundreds of microns, surpassing previous methods.
Findings
Larger graphene domains correlate with higher carrier mobility.
Growth parameters significantly influence domain size and surface coverage.
Domains are crystallographically rotated with angles from 13° to 30°.
Abstract
The fundamental properties of graphene are making it an attractive material for a wide variety of applications. Various techniques have been developed to produce graphene and recently we discovered the synthesis of large area graphene by chemical vapor deposition (CVD) of methane on Cu foils. We also showed that graphene growth on Cu is a surface-mediated process and the films were polycrystalline with domains having an area of tens of square microns. In this paper we report on the effect of growth parameters such as temperature, and methane flow rate and partial pressure on the growth rate, domain size, and surface coverage of graphene as determined by Raman spectroscopy, and transmission and scanning electron microscopy. Based on the results, we developed a two-step CVD process to synthesize graphene films with domains having an area of hundreds of square microns. Scanning electron…
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