Graphite Nanoeraser
Ze Liu, Peter. B{\o}ggild, Jia-rui Yang, Yao Cheng, Francois Grey,, Yi-lun Liu, Li Wang, Quan-shui Zheng

TL;DR
This paper introduces a nanoeraser technique for effectively cleaning contamination from graphite surfaces, restoring their cleanliness and bonding properties, which has implications for preparing ultraclean surfaces.
Contribution
The study demonstrates a novel mechanical cleaning method using a graphite nanoeraser to remove contamination from graphite surfaces, restoring their van der Waals bonding capabilities.
Findings
Mechanical wiping with a graphite nanoeraser reduces contamination significantly.
Post-cleaning, graphite surfaces can self-retract, indicating restored van der Waals contact.
The method enables preparation of ultraclean graphite surfaces comparable to clean-room standards.
Abstract
We present here a method for cleaning intermediate-size (5~50nm) contamination from highly oriented pyrolytic graphite. Electron beam deposition causes a continuous increase of carbonaceous material on graphene and graphite surfaces, which is difficult to remove by conventional techniques. Direct mechanical wiping using a graphite nanoeraser is observed to drastically reduce the amount of contamination. After the mechanical removal of contamination, the graphite surfaces were able to self-retract after shearing, indicating that van der Waals contact bonding is restored. Since contact bonding provides an indication of a level of cleanliness normally only attainable in a high-quality clean-room, we discuss potential applications in preparation of ultraclean surfaces.
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