Band structure of Si/Ge core-shell nanowires along [110] direction modulated by external uniaxial strain
Xihong Peng, Fu Tang, Paul Logan

TL;DR
This study investigates how uniaxial strain influences the electronic band structure of Si/Ge core-shell nanowires along [110], revealing significant band gap modulation, a direct-to-indirect transition, and effective mass tuning of charge carriers.
Contribution
The paper provides a detailed first-principles analysis of strain effects on the band structure and carrier effective masses in Si/Ge core-shell nanowires, highlighting new insights into strain-induced electronic property control.
Findings
Band gap can be significantly tuned by uniaxial strain.
A transition from direct to indirect band gap occurs at ~1% tensile strain.
Effective masses of holes increase with tensile strain, minimal effect on electrons.
Abstract
Strain modulated electronic properties of Si/Ge core-shell nanowires along [110] direction were reported based on first principles density-functional theory calculations. Particularly, the energy dispersion relationship of the conduction/valence band was explored in detail. At the {\Gamma} point, the energy levels of both bands are significantly altered by applied uniaxial strain, which results in an evident change of band gap. In contrast, for the K vectors far away from {\Gamma}, the variation of the conduction/valence band with strain is much reduced. In addition, with a sufficient tensile strain (~1%), the valence band edge (VBE) shifts away from {\Gamma}, which indicates that the band gap of the Si/Ge core-shell nanowires experiences a transition from direct to indirect. Our studies further showed that effective masses of charge carriers can be also tuned by the external uniaxial…
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