Near infra-red Mueller matrix imaging system and application to strain imaging

TL;DR

This paper introduces a near-infrared Mueller matrix imaging system designed for strain imaging in transparent solids, demonstrating its capability to analyze complex strain patterns in multi-crystalline silicon wafers.

Contribution

The paper presents a novel near-infrared Mueller matrix imaging ellipsometer and applies it to visualize complex strain domains in silicon wafers, advancing strain imaging techniques.

Findings

Effective imaging of complex strain domains in silicon wafers.

The system operates successfully in the near-infrared range.

Potential applications in materials science and semiconductor inspection.

Abstract

We report on the design and performance of a near infra-red Mueller matrix imaging ellipsometer, and apply the instrument to strain imag- ing in near infra-red transparent solids. Particularly, we show that the instrument can be used to investigate complex strain domains in multi-crystalline silicon wafers.