Temperature dependence of reflectivity of amorphous silicon dioxide: Evidence of delocalized excitons weakly scattered by phonons
E. Vella, F. Messina, M. Cannas, R. Boscaino

TL;DR
This study investigates the temperature-dependent reflectivity spectra of amorphous silicon dioxide, revealing that excitons remain weakly scattered by phonons across temperatures, which influences their mobility and optical properties.
Contribution
The paper provides new evidence that excitons in amorphous SiO2 are weakly scattered by phonons, maintaining Lorentzian line-shapes and influencing exciton dynamics and optical features.
Findings
Exciton peak at 10.4 eV has a Lorentzian shape at all temperatures.
Excitons in SiO2 are weakly scattered by phonons, preserving mobility.
Temperature affects the spectral line-shape of certain peaks and the Urbach tail.
Abstract
We studied the reflectivity spectra of amorphous silicon dioxide detected under vacuum UV synchrotron radiation as a function of temperature between 10 and 300 K. Kramers-Kronig dispersion analysis of reflectivity spectra allowed us to determine the absorption coefficient in the range from 8 to 17.5 eV. Spectra show four main peaks, the spectral positions of which are consistent with literature data. An appreciable dependence of the line-shape on temperature is observed for the first two peaks only. We demonstrate the exciton peak at 10.4 eV to have a very good Lorentzian band-shape at all the examined temperatures. Based on existing theoretical models, this allows to argue excitons in SiO2 to be weakly scattered by phonons, thus retaining their mobility properties notwithstanding the effects of exciton-phonon coupling and of intrinsic structural disorder of amorphous SiO2. Moreover,…
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Taxonomy
TopicsThin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies
