Elastic Mid-Infrared Light Scattering: a Basis for Microscopy of Large-Scale Electrically Active Defects in Semiconducting Materials
V. P. Kalinushkin, V. A. Yuryev, O. V. Astafiev

TL;DR
This paper introduces a mid-infrared laser microscopy technique that enables non-destructive visualization and analysis of large-scale electrically active defects in semiconductors, enhancing inspection in microelectronics and photovoltaics.
Contribution
It presents a novel dark-field mid-IR-laser microscopy method for visualizing large-scale defects and analyzing their composition in semiconductors.
Findings
Visualization of large-scale electrically active defects.
Application of dark-field filtering for defect imaging.
Techniques for defect composition analysis.
Abstract
A method of the mid-IR-laser microscopy has been proposed for the investigation of the large-scale electrically and recombination active defects in semiconductors and non-destructive inspection of semiconductor materials and structures in the industries of microelectronics and photovoltaics. The basis for this development was laid with a wide cycle of the investigations on the low-angle mid-IR-light scattering in semiconductors. The essence of the technical idea was to apply the dark-field method for spatial filtering of the scattered light in the scanning mid-IR-laser microscope. This approach enabled the visualization of large-scale electrically active defects which are the regions enriched with ionized electrically active centers. The photoexcitation of excess carriers within a small volume located in the probe mid-IR-laser beam enabled the visualization of the large-scale…
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