Projectile's mass, reactivity and molecular dependence on ion nanostructuring

TL;DR

This study investigates how projectile mass, chemical reactivity, and molecular state influence ion beam-induced nanopatterning on silicon surfaces, revealing dependencies that inform controlled nanostructure fabrication.

Contribution

It provides experimental insights into the effects of projectile properties on nanopattern formation, advancing understanding of ion-induced surface nanostructuring mechanisms.

Findings

Ripple structures depend on projectile mass and reactivity

Molecular ions induce different surface patterns than atomic ions

Ion parameters can be tuned for controlled nanopatterning

Abstract

We have reported the dependence of projectile mass along with the chemical reactivity and nonlinear effects on ion beam induced nano structure formation when 8 keV He1+, N1+, O1+, Ar1+ atomic ions and 16 keV N21+ and O21+ molecular ions are bombarded on the Si (100) surface at an incidence angle of 600. Ex situ atomic force microcopy (AFM) measurements reveals the ripple structure development of various forms and dimensions depending on the projectiles mass, chemical reactivity and molecular state. This experimental study explores the necessary requirements for ion induced nanopatterning and their control.