Growth of monolayer graphene on 8deg off-axis 4H-SiC (000-1) substrates with application to quantum transport devices
N. Camara, B. Jouault, A. Caboni, B. Jabakhanji, W. Desrat, E. Pausas,, C. Consejo, N. Mestres, P. Godignon, J. Camassel

TL;DR
This study demonstrates the growth of high-quality monolayer graphene on off-axis 4H-SiC substrates, exhibiting properties suitable for quantum transport applications and integration with existing SiC device technology.
Contribution
It introduces a method for growing large, homogeneous monolayer graphene on off-axis SiC with confirmed high quality and quantum Hall effects.
Findings
High carrier mobility in graphene layers
Observation of half-integer Quantum Hall effect
Moderate p-type doping levels
Abstract
Using high temperature annealing conditions with a graphite cap covering the C-face of an 8deg off-axis 4H-SiC sample, large and homogeneous single epitaxial graphene layers have been grown. Raman spectroscopy shows evidence of the almost free-standing character of these monolayer graphene sheets, which was confirmed by magneto-transport measurements. We find a moderate p-type doping, high carrier mobility and half integer Quantum Hall effect typical of high quality graphene samples. This opens the way to a fully compatible integration of graphene with SiC devices on the wafers that constitute the standard in today's SiC industry.
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