Diffraction-Attenuation Resistant Beams: their Higher Order Versions and Finite-Aperture Generations

TL;DR

This paper extends the concept of diffraction-attenuation resistant beams to finite-aperture generation and higher order versions, enhancing control over their profiles for various practical applications.

Contribution

It demonstrates that such beams retain their resistance when generated by finite apertures and introduces a method for higher control of their transverse intensity profiles.

Findings

Beams maintain resistance with finite apertures

Extension to higher order and vector fields

Potential applications in optics and sensing

Abstract

Recently, a method for obtaining diffraction-attenuation resistant beams in absorbing media was developed through suitable superposition of ideal zero-order Bessel beams. In this work, we will show that such beams maintain their resistance to diffraction and absorption even when generated by finite apertures. Also, we shall extend the original method to allow a higher control over the transverse intensity profile of the beams. Although the method has been developed for scalar fields, it can be applied to paraxial vector wave fields as well. These new beams can possess potential applications, such as free space optics, medical apparatuses, remote sensing, optical tweezers, etc..