Fluorographene: Two Dimensional Counterpart of Teflon
R. R. Nair, W. C. Ren, R. Jalil, I. Riaz, V. G. Kravets, L. Britnell,, P. Blake, F. Schedin, A. S. Mayorov, S. Yuan, M. I. Katsnelson, H. M. Cheng,, W. Strupinski, L. G. Bulusheva, A. V. Okotrub, I. V. Grigorieva, A. N., Grigorenko, K. S. Novoselov, A. K. Geim
TL;DR
This paper introduces fluorographene, a stoichiometric derivative of graphene with fluorine atoms, exhibiting insulating properties, high stability, and mechanical strength comparable to graphene, representing a significant advancement in 2D material functionalization.
Contribution
It reports the synthesis and comprehensive characterization of fluorographene as a stable, insulating 2D material with unique optical, mechanical, and chemical properties.
Findings
Fluorographene is a high-quality insulator with resistivity >10^12 Ohm per square.
It has an optical gap of 3 eV.
It maintains graphene's mechanical strength and stability up to 400°C.
Abstract
We report a stoichiometric derivative of graphene with a fluorine atom attached to each carbon. Raman, optical, structural, micromechanical and transport studies show that the material is qualitatively different from the known graphene-based nonstoichiometric derivatives. Fluorographene is a high-quality insulator (resistivity >10^12 Ohm per square) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting Young's modulus of 100 N/m and sustaining strains of 15%. Fluorographene is inert and stable up to 400C even in air, similar to Teflon.
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