Stochastic effects at ripple formation processes in anisotropic systems with multiplicative noise
D.O. Kharchenko, V.O. Kharchenko, I.O. Lysenko, S.V. Kokhan

TL;DR
This paper investigates how multiplicative noise influences ripple pattern formation in anisotropic systems modeled by a generalized Kuramoto-Sivashinsky equation, revealing the impact of ion beam parameters on pattern topology and dynamics.
Contribution
It introduces a generalized model incorporating multiplicative noise to study ripple formation, highlighting the effects of ion beam parameters on pattern topology and dynamics.
Findings
Noise significantly affects ripple pattern formation.
Ion beam parameters alter pattern topology.
Scaling behavior of surface roughness is analyzed.
Abstract
We study pattern formation processes in anisotropic system governed by the Kuramoto-Sivashinsky equation with multiplicative noise as a generalization of the Bradley-Harper model for ripple formation induced by ion bombardment. For both linear and nonlinear systems we study noise induced effects at ripple formation and discuss scaling behavior of the surface growth and roughness characteristics. It was found that the secondary parameters of the ion beam (beam profile and variations of an incidence angle) can crucially change the topology of patterns and the corresponding dynamics.
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