Diodes with Breakdown Voltages Enhanced by the Metal-Insulator Transition of LaAlO$_3$-SrTiO$_3$ Interfaces
R. Jany, M. Breitschaft, G. Hammerl, A. Horsche, C. Richter, S., Paetel, J. Mannhart, N. Stucki, N. Reyren, S. Gariglio, P. Zubko, A. D., Caviglia, J.-M. Triscone

TL;DR
This paper reports the fabrication of oxide diodes utilizing the metal-insulator transition at LaAlO3-SrTiO3 interfaces, achieving high breakdown voltages and significant capacitance changes, with robust operation at elevated temperatures.
Contribution
It introduces a novel diode design leveraging the metal-insulator transition to enhance breakdown voltage and capacitance tunability.
Findings
Breakdown voltages up to 200 V at room temperature.
Capacitance change factor of 150 with applied voltage.
Robust operation up to 270°C.
Abstract
Using the metal-insulator transition that takes place as a function of carrier density at the LaAlO-SrTiO interface, oxide diodes have been fabricated with room-temperature breakdown voltages of up to 200 V. With applied voltage, the capacitance of the diodes changes by a factor of 150. The diodes are robust and operate at temperatures up to 270 C.
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