Exploiting and engineering the optical field-enhancement in metal nanoparticle based circuits

TL;DR

This paper investigates how optical field-enhancement effects, including plasmon resonance and engineered electromagnetic amplification, influence the optoelectronic properties of metal nanoparticle arrays, with potential applications in nano-optics.

Contribution

It demonstrates a novel fabrication approach combining focused ion beam lithography and electron beam deposition to enhance electromagnetic fields in nanoparticle circuits.

Findings

Field-enhancement observed in photoconductance measurements

Electromagnetic amplification achieved through patterning techniques

Plasmon resonance contributes to increased optoelectronic response

Abstract

We study the impact of optical field-enhancement effects on the optoelectronic properties of metal nanoparticle arrays. Applying a focused ion beam lithography in combination with an electron beam deposition technique we can pattern electrical contacts in a way to give rise to an electromagnetic field-enhancement. A further field-enhancement is achieved by the plasmon resonance of the particles. Both effects are directly observed in the photoconductance of the arrays.