In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy

TL;DR

This paper presents an in-situ atomic force microscopy method for directly visualizing e-beam patterns on unprocessed resists, enabling immediate analysis of irradiated surfaces without additional processing steps.

Contribution

It introduces a novel in-situ AFM technique integrated with e-beam lithography for real-time surface topography analysis of irradiated resists.

Findings

Patterns can be visualized immediately after e-beam exposure

No development or baking steps are required before analysis

The method reveals the chemical (latent) image of the resist

Abstract

We introduce an in-situ characterization method of resists used for e-beam lithography. The technique is based on the application of an atomic force microscope which is directly mounted below the cathode of an electron-beam lithography system. We demonstrate that patterns irradiated by the e-beam can be efficiently visualized and analyzed in surface topography directly after the e-beam exposure. This in-situ analysis takes place without any development or baking steps, and gives access to the chemical (or latent) image of the irradiated resist.