Electrically Detected Magnetic Resonance Applied to the Study of Near Surface Electron Donors in Silicon
W.D. Hutchison, P.G. Spizzirri, F. Hoehne, M.S. Brandt

TL;DR
This paper demonstrates the use of electrically detected magnetic resonance (EDMR) to study near-surface electron donors in silicon, revealing interactions between donor and trap states in doped silicon devices.
Contribution
It applies EDMR to small silicon devices with various phosphorus concentrations and surface types to analyze donor-trap interactions.
Findings
EDMR signals depend on phosphorus concentration and surface type
Donor and trap states influence EDMR signal characteristics
Method provides insights into near-surface electronic properties
Abstract
Electrically detected magnetic resonance (EDMR) is applied to mm size devices with implanted leads and a 50 micron square gap laid down on bulk phosphorus doped silicon. Devices with a range of phosphorus concentrations and surface types were prepared and measured to examine the interplay between donor and charge trap states in producing EDMR signals.
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Taxonomy
TopicsSilicon and Solar Cell Technologies · Integrated Circuits and Semiconductor Failure Analysis · Thin-Film Transistor Technologies
