Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
Hongyu Wang, Wei Jiang, Zhenhua Bi, Younian Wang
TL;DR
This paper introduces a novel perpendicular electrode configuration for dual-frequency capacitively coupled plasmas, effectively reducing electromagnetic and coupling issues using particle-in-cell simulations.
Contribution
It proposes a new electrode arrangement for DF-CCP that mitigates electromagnetic and coupling effects, validated through simulation.
Findings
Reduces electromagnetic interference in DF-CCP
Mitigates dual-frequency coupling effects
Enhances plasma stability and uniformity
Abstract
We proposed an altered configuration for dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs of electrodes are arranged oppositely, and the discharging is perpendicularly driven by two rf sources. With Particle-in-cell/Monte Carlo method, we have demonstrated this configuration can remove the harmful electromagnetic and DF coupling effects in conventional DF-CCP.
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Taxonomy
TopicsPlasma Diagnostics and Applications · Dust and Plasma Wave Phenomena · Metal and Thin Film Mechanics