High-resolution soft-X-ray beamline ADRESS at Swiss Light Source for resonant inelastic X-ray scattering and angle-resolved photoelectron spectroscopies
V.N. Strocov, T. Schmitt, U. Flechsig, T. Schmidt, A. Imhof, Q. Chen,, J. Raabe, R. Betemps, D. Zimoch, J. Krempasky, A. Piazzalunga, X. Wang, M., Grioni, L. Patthey

TL;DR
This paper details the design, technical realization, and capabilities of the high-resolution ADRESS soft-X-ray beamline at Swiss Light Source, optimized for RIXS and ARPES with high flux, resolution, and polarization control.
Contribution
It introduces a novel fixed-gap undulator design and optimized optics enabling high flux and resolution for soft-X-ray spectroscopy at the Swiss Light Source.
Findings
Achieves a resolving power above 33000 at 1 keV
Delivers photon flux up to 1.0e13 photons/sec/0.01%BW at 1 keV
Provides a vertical spot size of 4 micrometers for high-resolution spectroscopy
Abstract
We describe the concepts and technical realization of the high-resolution soft-X-ray beamline ADRESS operating in the energy range from 300 to 1600 eV and intended for Resonant Inelastic X-ray Scattering (RIXS) and Angle-Resolved Photoelectron Spectroscopy (ARPES). The photon source is an undulator of novel fixed-gap design where longitudinal movement of permanent magnetic arrays controls not only the light polarization (including circular and 0-180 deg rotatable linear polarizations) but also the energy without changing the gap. The beamline optics is based on the well-established scheme of plane grating monochromator (PGM) operating in collimated light. The ultimate resolving power E/dE is above 33000 at 1 keV photon energy. The choice of blazed vs lamellar gratings and optimization of their profile parameters is described. Due to glancing angles on the mirrors as well as optimized…
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Taxonomy
TopicsX-ray Spectroscopy and Fluorescence Analysis · Advanced X-ray Imaging Techniques · Crystallography and Radiation Phenomena
