# SiC Graphene Suitable For Quantum Hall Resistance Metrology

**Authors:** Samuel Lara-Avila, Alexei Kalaboukhov, Sara Paolillo, Mikael, Syv\"aj\"arvi, Rositza Yakimova, Vladimir Fal'ko, Alexander Tzalenchuk and, Sergey Kubatkin

arXiv: 0909.1193 · 2010-04-28

## TL;DR

This paper reports the first observation of the quantum Hall effect in epitaxial graphene on silicon carbide, demonstrating its potential for quantum resistance metrology and scalable electronics.

## Contribution

It provides the first experimental evidence of the quantum Hall effect in epitaxial graphene on SiC, confirming its suitability for high-precision metrology and scalable device fabrication.

## Key findings

- Quantum Hall effect observed in epitaxial graphene
- Consistent results across multiple devices on a large wafer
- Potential for high-temperature quantum resistance standards

## Abstract

We report the first observation of the quantum Hall effect in epitaxial graphene. The result described in the submitted manuscript fills the yawning gap in the understanding of the electronic properties of this truly remarkable material and demonstrate suitability of the silicon carbide technology for manufactiring large area high quality graphene. Having found the quantum Hall effect in several devices produced on distant parts of a single large-area wafer, we can confirm that material synthesized on the Si-terminated face of SiC promises a suitable platform for the implementations of quantum resistance metrology at elevated temperatures and, in the longer term, opens bright prospects for scalable electronics based on graphene.

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Source: https://tomesphere.com/paper/0909.1193