Coherent scattering from silicon mocrystal surface
F. Livet, G. Beutier, M. de Boissieu, S. Ravy, F. Picca, D. Le, Bolloc'h, V. Jacques

TL;DR
This study uses coherent x-ray scattering to reveal atomic step roughness on a silicon monocrystal surface, demonstrating the technique's sensitivity to surface features and potential for studying step dynamics.
Contribution
It introduces a method to detect atomic step roughness on silicon surfaces using coherent x-ray scattering near the anti-Bragg position.
Findings
Atomic step roughness detected on silicon surface.
Speckle pattern analysis confirms monoatomic step sensitivity.
Technique paves the way for studying surface step dynamics.
Abstract
Using coherent x-ray scattering, we evidenced atomic step roughness at the [111] vicinal surface of a silicon monocrystal of 0.05 degree miscut. Close to the (1/2 1/2 1/2) anti-Bragg position of the reciprocal space which is particularly sensitive to the [111] surface, the truncation rod exhibits a contrasted speckle pattern that merges into a single peak closer to the (111) Bragg peak of the bulk. The elongated shape of the speckles along the[111] direction confirms the monoatomic step sensibility of the technique. This experiment opens the way towards studies of step dynamics on crystalline surfaces.
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Taxonomy
TopicsElectron and X-Ray Spectroscopy Techniques · Advanced X-ray Imaging Techniques · Surface Roughness and Optical Measurements
