Atomic layer deposition of ZnS nanotubes
Sh. Farhangfar, R. B. Yang, M. Pelletier, K. Nielsch
TL;DR
This paper demonstrates the fabrication of high-aspect-ratio ZnS nanotubes with tunable dimensions using atomic layer deposition at low temperatures, providing a versatile platform for applications and fundamental studies.
Contribution
It introduces a method for growing high-quality ZnS nanotubes with precise control over their dimensions via ALD at low temperatures.
Findings
Successful synthesis of high-aspect-ratio ZnS nanotubes
Control over wall thickness and diameter
Potential for studying size-dependent phenomena
Abstract
We report on growth of high-aspect-ratio () zinc sulfide nanotubes with variable, precisely tunable, wall thicknesses and tube diameters into highly ordered pores of anodic alumina templates by atomic layer deposition (ALD) at temperatures as low as 75 C. Various characterization techniques are employed to gain information on the composition, morphology, and crystal structure of the synthesized samples. Besides practical applications, the ALD-grown tubes could be envisaged as model systems for the study of a certain class of size-dependent quantum and classical phenomena.
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