Nonadiabatic simulation study of photoisomerization of azobenzene: Detailed mechanism and load-resisting capacity
Junfeng Shao, Yibo Lei, Zhenyi Wen, Yusheng Dou, and Zhisong Wang

TL;DR
This study uses nonadiabatic simulations to explore azobenzene photoisomerization mechanisms and load-resisting capacities, revealing out-of-plane rotation as the dominant process and identifying force thresholds for mechanical isomerization.
Contribution
It provides a detailed nonadiabatic simulation analysis of azobenzene's photoisomerization and mechanical switching, challenging previous in-plane inversion hypotheses and quantifying load thresholds.
Findings
Photoisomerization occurs mainly via out-of-plane rotation.
External forces of 90-200 pN can inhibit photoisomerization.
Mechanical isomerization requires forces of 1250-1650 pN.
Abstract
Nonadiabatic dynamical simulations were carried out to study cis-to-trans isomerization of azobenzene under laser irradiation and/or external mechanical loads. We used a semiclassical electron-radiation-ion dynamics method that is able to describe the coevolution of the structural dynamics and the underlying electronic dynamics in a real-time manner. It is found that azobenzene photoisomerization occurs predominantly by an out-of-plane rotation mechanism even under a nontrivial resisting force of several tens of piconewtons. We have repeated the simulations systematically for a broad range of parameters for laser pulses, but could not find any photoisomerization event by a previously suggested in-plane inversion mechanism. The simulations found that the photoisomerization process can be held back by an external resisting force of 90 - 200 pN depending on the frequency and intensity of…
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